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  • Journal of Lightwave Technology
  • Vol. 34,
  • Issue 4,
  • pp. 1288-1292
  • (2016)

Postfabrication Trimming of CMOS-Compatible Athermal MZI by Thermal Annealing

Jong-Moo Lee, Min-su Kim, Maryse Fournier, Pierre Labeye, Claudio J. Oton, and Francesco Testa

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Abstract

CMOS-compatible athermal MZI is postfabrication trimmed in wavelength from −0.15 to −5.15 nm using thermal annealing process from 400 to 530 °C. The MZI filter shows temperature dependence less than 2 pm/°C and the temperature dependence is maintained after the annealing process.

© 2016 IEEE

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