Abstract

The authors have developed a nanomanufacturing platform based on wafer-level nanoreplication with mold and nanopattern transfer by nanolithography. The nanoreplication process, which is based on imprinting a single-layer spin-coated ultraviolet (UV)-curable resist, achieved good nanopatterning fidelity and on-wafer uniformity with high throughput. Some manufacturing issues of the nanoreplication process, such as the impact of wafer and mold surface particles on nanoreplication yield, are also discussed. Nano-optic devices, such as,quarter-wave plates and polarizers, were manufactured with the nanomanufacturing platform. An average wafer-level optical performance yield of 86% was achieved. The developed technology is applied for high-throughput and low-cost manufacturing nanostructure-based optical devices and integrated optical devices.

© 2005 IEEE

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